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Thermal Stability of Ferroelectric Films Based on Hafnium–Zirconium Dioxide on Silicon

Владимир Попов,V. A. Antonov,F. V. Tikhonenko,A. V. Myakon’kikh,К. В. Руденко

Atomic layer deposition

Materials science

Ferroelectricity

2023

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“Thermal Stability of Ferroelectric Films Based on Hafnium–Zirconium Dioxide on Silicon” is a paper by Владимир Попов V. A. Antonov F. V. Tikhonenko A. V. Myakon’kikh К. В. Руденко published in 2023. It has an Open Access status of “closed”. You can read and download a PDF Full Text of this paper here.