DOI: 10.1063/1.125779

¤ OpenAccess: Bronze

This work has “Bronze” OA status. This means it is free to read on the publisher landing page, but without any identifiable license.

Structure and stability of ultrathin zirconium oxide layers on Si(001)

M. Copel,M. Gribelyuk,Evgeni Gusev

Annealing (glass)

Nucleation

Materials science

2000

We have examined the structure of ultrathin ZrO2 layers on Si(001) using medium energy ion scattering and cross-sectional transmission electron microscopy. Films can be deposited on SiO2 layers with highly abrupt interfaces by atomic layer deposition. On HF stripped Si(001), nucleation was inhibited, resulting in poorer film morphology. ZrO2 showed remarkable stability against silicate formation, with no intermixing even after high temperature oxidation. The oxide is vulnerable to high temperature vacuum annealing, with silicidation occurring at temperatures above 900 °C.

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“Structure and stability of ultrathin zirconium oxide layers on Si(001)” is a paper by M. Copel M. Gribelyuk Evgeni Gusev published in 2000. It has an Open Access status of “bronze”. You can read and download a PDF Full Text of this paper here.