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Fluorographene: A Two‐Dimensional Counterpart of Teflon

R. R. Nair,Wencai Ren,R. Jalil,Ibtsam Riaz,V. G. Kravets,L. Britnell,P. Blake,F. Schedin,Alexander S. Mayorov,Shengjun Yuan,Mikhail I. Katsnelson,Hui‐Ming Cheng,Włodek Strupiński,L. G. Bulusheva,А. В. Окотруб,I. V. Grigorieva,А. Н. Григоренко,К. С. Новоселов,A. K. Geǐm

Graphene

Raman spectroscopy

Materials science

2010

A stoichiometric derivative of graphene with a fluorine atom attached to each carbon is reported. Raman, optical, structural, micromechanical, and transport studies show that the material is qualitatively different from the known graphene-based nonstoichiometric derivatives. Fluorographene is a high-quality insulator (resistivity >10(12) Ω) with an optical gap of 3 eV. It inherits the mechanical strength of graphene, exhibiting a Young's modulus of 100 N m(-1) and sustaining strains of 15%. Fluorographene is inert and stable up to 400 °C even in air, similar to Teflon.

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“Fluorographene: A Two‐Dimensional Counterpart of Teflon” is a paper by R. R. Nair Wencai Ren R. Jalil Ibtsam Riaz V. G. Kravets L. Britnell P. Blake F. Schedin Alexander S. Mayorov Shengjun Yuan Mikhail I. Katsnelson Hui‐Ming Cheng Włodek Strupiński L. G. Bulusheva А. В. Окотруб I. V. Grigorieva А. Н. Григоренко К. С. Новоселов A. K. Geǐm published in 2010. It has an Open Access status of “green”. You can read and download a PDF Full Text of this paper here.