Open Access Extreme ultraviolet lithography Journals
A list of Open Access Extreme ultraviolet lithography journals for you to publish your manuscript in
Extreme ultraviolet lithography is a next-generation lithography technology using an extreme ultraviolet (EUV) wavelength, currently expected to be 13.5 nm.
All articles published in Open Access journals have undergone peer review and upon acceptance are immediately and permanently free for everyone to read and download.
We hope this list of Extreme ultraviolet lithography OA journals will be helpful for you in deciding where to publish your Extreme ultraviolet lithography manuscript.
Our list includes all the high-impact factor Extreme ultraviolet lithography journals that may be relevant to your field of study. In any case, we've also included other journals that may also offer more affordable publishing fees.Rather than just the top hits Extreme ultraviolet lithography journals, we have made an exhaustive list of open accesss Extreme ultraviolet lithography journals. Use our different columns — number of papers, number of citations, and relevance — to find the best Extreme ultraviolet lithography venue for your manuscript.
The DOAJ columns refers to the The Directory of Open Access Journals, a list of open access journals, maintained by Infrastructure Services for Open Access.
There are certain criteria a journal must meet to be indexed by DOAJ, and thus inclusion in the DOAJ index is seen by scholars as a mark of quality.
All the open access Extreme ultraviolet lithography journals in this list are indexed in OA.mg.
If you spot any mistakes in this table of Extreme ultraviolet lithography OA journals, don’t hesitate to send us an email.
Name | ISSN | DOAJ | Publisher | No. of Papers | Citations | Relevance▼ | Website |
---|